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Advanced Dopant Profile Control for Plasma Doping Processes
Advanced Dopant Profile Control for Plasma Doping Processes
2009
Ludovic Godet
Shu Qin
Ziwei Fang
George D. Papasouliotis
Timothy Miller
Vikram Singh
Svetlana Radovanov
Keywords:
Ion implantation
Plasma-immersion ion implantation
Plasma
Dopant
Analytical chemistry
Doping
Mass spectrometry
Materials science
Optoelectronics
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