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Development of silicon film growth at high rate in SiHCl 3 -SiH x -H 2 system
Development of silicon film growth at high rate in SiHCl 3 -SiH x -H 2 system
2015
Ayumi Saito
Keywords:
Reaction mechanism
Photochemistry
Silicon
Chemistry
Analytical chemistry
Growth rate
high rate
Materials science
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