Research on the Mesa Etch of OEIC

The etch-stop process is developed completely and applied to the fabrication of OEIC(Optoelectronic Integrated Circuits)through deeply studying the mechanism of sacrificial layer etching.The problems such as side etching,mesa deformation and surface cleaning etc in the experiment are found.The key point of the problems is analyzed through the studying of experiments and the standard process is improved including new etchant and new technological process.All the problems are solved by improved process and it can be applied to the following process completely.