Application of the generalized curvilinear variable axis lens to electron projection

The concept of the curvilinear variable axis lens (CVAL) has been introduced for the optics of projection reduction exposure with variable axis immersion lenses, an approach to electron projection lithography reported elsewhere. In the proof-of-concept system the special case of a planar CVAL following the fundamental imaging ray of the lens system was implemented and next generation lithography-commensurate performance was demonstrated. The present work addresses the question of whether general types of CVAL with different configurations of the optical elements are practical and acceptable in performance. Specifically, an analysis is presented of the performance trends of such optics in terms of blur and distortion depending on configuration, number and position of the optical elements in the system, as well as their relative drive requirements.