Preparation of CNx/TiNy multilayers by ion beam sputtering

Abstract CN x /TiN y multilayers have been prepared by ion beam sputtering and analyzed by X-ray diffraction, transmission electron microscopy, selected area electron diffraction, energy dispersive X-ray and X-ray photoemission spectroscopy. The structure analyses shows that the films may contain several different kinds of CN crystals embedded in the amorphous matrix. These crystals have hexagonal and cubic crystalline structures. The TiN x layer in multilayers is primarily amorphous and contains only a few dispersed Ti 2 N crystals. The thickness of CN x and TiN y layers in the CN x /TiN y multilayers is about 20 and 30 nm, respectively. The atomic ratios of [N]/([C]+[N]+[Ti]) in the multilayers vary from 20 to 41 at%. The bonding ratios of CN/CN of the CN x layer in multilayers reach 0.447 or 0.585 as calculated from the C1s and N1s X-ray photoemission spectra, respectively.