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Photo resist removal process using wet treatment after plasma doping
Photo resist removal process using wet treatment after plasma doping
2006
Issui Aiba
Cheng-Guo Jin
Yuichiro Sasaki
Kazuo Tsutsui
Hideki Tamura
Katsumi Okashita
Hiroyuki Ito
Bunji Mizuno
Parhat Ahmet
Kuniyuki Kakushima
Hiroshi Iwai
Keywords:
Chemical engineering
Materials science
Doping
Photoresist
process
Plasma
Correction
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