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Validation of Inductively Coupled Plasmas Sustained in Halogen Chemistries
Validation of Inductively Coupled Plasmas Sustained in Halogen Chemistries
2015
Ankur Agarwal
Mickael Foucher
Shahid Rauf
Jean-Paul Booth
Pascal Chabert
Kenneth S. Collins
Keywords:
Plasma
Materials science
Analytical chemistry
Halogen
Correction
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