SnO2:F thin films deposited by RF magnetron sputtering: effect of the SnF2 amount in the target on the physical properties

SnO_(2):F thin films were prepared by RF magnetron sputtering onto glass substrates using SnF_(2) as fluorine source. The films were deposited under a mixed argon/hydrogen atmosphere at a substrate temperature of 500oC. The X-ray diffraction shows that polycrystalline films were grown with a phases mixture of SnO_(2) and SnO. The optical transmittance is between 80 and 90%. The physical properties of the films suggest that SnO_(2) tin films grown with small SnF_(2) content in the target can be considered as candidates for transparent electrodes.