Growth of well-aligned carbon nanotubes by RF-DC plasma chemical vapor deposition

Abstract Highly aligned carbon nanotubes (CNTs) were grown under high sheath electric field and gas pressure conditions by the radio frequency (RF) plasma-enhanced direct current (DC) plasma chemical vapor deposition (CVD) method due to a stabilized DC discharge. The uniform growth of highly aligned multi-walled CNTs was achieved over the entire surface area of a 50 × 50 mm 2 iron foil. The growth of multi-walled CNTs on a 75 × 75 mm 2 iron foil was also confirmed.