An aberration control of projection optics for multi-patterning lithography
2011
In order to realize further improvement of productivity of semiconductor manufacturing, higher throughput and better
imaging performance are required for the exposure tool. Therefore, aberration control of the projection lens is becoming
more and more important not only for cool status performance but also heating status. In this paper, we show the
improvements of cool status lens aberration, including scalar wavefront performance and polarization aberration
performance. We also discuss various techniques for controlling thermal aberrations including reduction of heat in the
lens, simulation, compensating knob, and adjusting method with actual imaging performance data during heating and
cooling.
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