Optical and Structural Characterization of Silicon Microstructures Fabricated by Laser Interference Crystallization

Uniform gratings of sharply defined polycrystalline silicon lines with micrometer-sized periods were created by laser interference crystallization of amorphous silicon. Atomic force microscopy (AFM) reveals that lines fabricated with high pulse energies (380 mJ/cm{sup 2}) contain large grains (dimensions up to 1.5 {micro}m), growing in a direction perpendicular to the lines. The authors assign this strong lateral growth to the melting of the material in the center of the lines combined with the presence of small grains, which act as nuclei, at the interfaces with the amorphous regions. Spatially resolved Raman spectroscopy shows that size effects dominate the Raman line shape at the edge of the line, confirming the AFM results, while stress increases towards the center of the line. The spectra measured in the middle of lines created with high energies show doping effects caused by the diffusion of boron atoms from the substrate upon exposure.