Multichamber rapid thermal processing

Silicon processing makes ever-increasing demands on the capabilities and quality of processing equipment. Rapid thermal processing (RTP) enables the use of thermally activated processes with the minimum thermal budget. Multi-chamber systems minimise turn around time whilst providing a high quality processing environment. This paper seeks to identify the issues associated with the use of RTP in multi-chamber systems from the reasons for considering it to the further work required to optimise it. 1.© (1991) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.