Multi-beam mask writer MBM-1000

Multi-beam mask writer MBM-1000 has been developed for N5. It is designed to accomplish high resolution with 10 nm beam and high throughput with 300 Gbps blanking aperture array (BAA) and inline real-time data path. It is equipped with function of pixel level dose correction (PLDC) to improve patterning resolution, which is method specific to multi-beam writer. Design concept of MBM-1000 is described. Writing test is carried out to demonstrate performance of MBM-1000 and PLDC function.