The radiation-sensitive resin composition, a polymer and a resist pattern forming method

Object of the present invention is to provide a good pattern shape, MEEF excellent performance, easy to produce defects such as pull wire radiation-sensitive resin composition, and a polymer suitable for the radiation-sensitive resin composition, and the use of the radiation sensitive resin composition pattern forming method; the radiation-sensitive resin composition comprising: [a] having at least one of a plurality of structural units and (1-2) are selected from the following formulas (1-1) structural units (the I), and the fluorine atom content in the polymer of at least 5% by mass, [B] having an acid-dissociable group, and the fluorine atom content is less than 5% by mass of the polymer, and [C] a radiation sensitive acid generator.