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Simulation of Graft Base Formation and Emitter Outdiffusion in High-Performance Bipolar LSIs
Simulation of Graft Base Formation and Emitter Outdiffusion in High-Performance Bipolar LSIs
1994
Puchner
Selberherr
Keywords:
Grain boundary
Common emitter
Materials science
Optoelectronics
Boron
Annealing (metallurgy)
Base (exponentiation)
Grain size
Correction
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