Composition of aqueous cleaner for removing residue

The present invention relates to an aqueous detergent composition, more particularly, to aqueous detergent compositions containing an inorganic fluorine compound, the aminosilane-based compound, a polar organic solvent and water. The aqueous detergent composition was greatly enhanced ion implantation, etching and / or ashing process the insulating film on the substrate as well as to effectively remove after the residues generated on the substrate, productivity, and reliability is also very low, the semiconductor manufacturing process, corrosion of the metal film can.