Modeling & cell design for metal deposition processes with complex geometry

1998 
Secondary current distribution was calculated for a metal deposition process on a cathode of complex geometry. Uniform thickness of the deposited metal layer is desired over the entire surface of the cathode, even in cases when the shape of the cathode is very complex. The uniformity of the deposit may be improved by inserting screening elements, auxiliary anodes or auxiliary cathodes (robbers) near the most exposed corners; also by choosing a convenient shape and position of the anodes, which may be connected to different DC sources.
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