Intense pulsed plasma x-ray source for lithography

The x‐pinch soft x‐ray source is described for application in submicron resolution lithography. Experiments have been performed to measure and characterize the radiation emitted from the magnesium wire x‐pinch plasma using an 80 ns, ≤500 kA pulse. Soft x‐ray yields of 14.2 J averaged over three independent calibrated diagnostics at 445 kA have been measured in magnesium K‐shell radiation (predominantly 8.4–9.4 A or 1.5–1.3 keV) from a submillimeter source, with as little as 5–10% of the yield below the 6.74 A silicon absorption edge. Samples of high sensitivity x‐ray resist have been exposed in as few as two pulses at a 10 cm distance. Observed scaling of the yield indicates the possibility of effectively exposing a resist at a distance of 40 cm using a<750 kA pulser.