Atmospheric Plasma-Enhanced Spatial Chemical Vapor Deposition of SiO2 Using Trivinylmethoxysilane and Oxygen Plasma
2020
SiO2 constitutes one of the most widely used dielectric materials in the microelectronics, packaging, and optical industries. Therefore, the development of new processes to deposit SiO2 at low temp...
Keywords:
- Correction
- Source
- Cite
- Save
- Machine Reading By IdeaReader
56
References
6
Citations
NaN
KQI