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Acemap > Paper > Low-pressure UV ozone and $UV/NF_3-H_2$ cleaning of the silicon surface coated with a commercial photoresist, AZ1512 = 상용감광제 AZ1512가 도포된 실리콘 표면의 저압 자외광 오존 및 자외광/삼불화질소-수소 표면처리

Low-pressure UV ozone and $UV/NF_3-H_2$ cleaning of the silicon surface coated with a commercial photoresist, AZ1512 = 상용감광제 AZ1512가 도포된 실리콘 표면의 저압 자외광 오존 및 자외광/삼불화질소-수소 표면처리

2001 
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