Preparation of Self-Patterned SrBi 2 Ta 2 O 9 Thin Films from Photo-Sensitive Solutions

Photo-sensitive SrBi 2 Ta 2 O 9 (SBT) solutions were evaluated and the patterning process flow for SBT films using the solutions was optimized. By adding a soft-bake process before UVirradiation, self-patterned SBT films were successfully prepared from the solutions and the cross sectional shape of the patterned films was improved. The photo-sensitivity of the solutions was estimated to be 900 mJ/cm 2 . The photo-reaction in the precursor gel film formed from the solution was traced by measuring IR absorption spectra. The obtained films had excellent ferroelectric properties comparable to conventional SBT films.