Transparent-conductive indium tin oxide films fabricated by atmospheric r.f. plasma deposition technique

Abstract We report new results on indium tin oxide (ITO) films fabricated on a soda lime silicate (SLS) glass by an atmospheric r.f. plasma mist deposition process. The ITO films and powders were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, and infrared spectroscopy. As-deposited films are uniform, transparent, and conductive. Phase formation, lattice parameters, and binding energies depend on the indium-to-tin ratio. When the tin concentration is low, the resultant phase is a cubic indium oxide. As the tin concentration increases from 0% to 40%, the cubic lattice parameter increases. When the indium concentration is low, the resultant phase is a tetragonal tin oxide. As the indium concentration increases from 0% to 20%, the tetragonal lattice parameters increase, while the tin binding energies decrease slightly.