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Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation
Surface morphology evolution during plasma etching of silicon: roughening, smoothing and ripple formation
2017
Kouichi Ono
Nobuya Nakazaki
Hirotaka Tsuda
Yoshinori Takao
Koji Eriguchi
Keywords:
Analytical chemistry
Nuclear magnetic resonance
Smoothing
Ripple
Physics
Plasma etching
Silicon
Optoelectronics
Morphology (linguistics)
Correction
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