Device and method for measuring micropore diffraction wavefront quality

The invention relates to a device and a method for measuring the micropore diffraction wavefront quality. According to the invention, measurement is carried out on the micropore diffraction wavefront quality by adopting a Shack-Hartmann wavefront sensor method. High-precision calibration for a Shack-Hartmann wavefront sensor is realized through a high-precision planar reference wavefront, then accurate measurement for the micropore diffraction wavefront shape is carried out according to a calibration result of a high-precision system error, the deviation of the micropore diffraction wavefront can be acquired by comparing the micropore diffraction wavefront shape with an optimal reference sphere, measurement for the micropore diffraction wavefront quality can be realized by only directly adding a focusing objective lens and a micropore on the basis of a calibration device, the operation is simple and convenient, the introduced system error is small, and high-precision calibration for the system error is implemented easily. Spherical aberration introduced by a micropore board can be compensated through the focusing lens, and quick high-precision measurement for the diffraction wavefront quality with different pore sizes can be realized through adjusting the distance between the Shack-Hartmann wavefront sensor and the micropore.