Effects of Substrate Temperature on Structure and Optical Property of Cu2O:N Thin Film Deposited by Reactive Pulse Magnetron Sputtering

N-doped Cu2O (Cu2O:N) thin films were deposited on glass substrate by reactive pulse magnetron sputtering method using Cu target in a mixture of N2、O2 and Ar atmosphere. Effect of substrate temperature on structure, surface morphology and optical properties of thin films were investigated by XRD, AFM and UV-Vis spectroscopy. The results showed that the single-phase of Cu2O(111) thin films were grown for substrate temperature < 200°C. The thin films deposited under different substrate temperatures are characteristics of 2D growth. Moreover,the optical band gap Eg of thin film was in the range 2.54-2.58eV, and slightly decreased with increasing of substrate temperatures from RT to 400°C.