Preparation of Half-Heusler Compound Semiconductor TiCoSb Thin Film by Magnetron Sputtering

A special TiCoSb composite target is designed with the convenience of adjusting film composition by varying the area of each element in the target.Using this target,polycrystalline TiCoSb thin films with single phase are successfully fabricated through direct current magnetron sputtering and rapid thermal annealing.The film structure and surface morphology of TiCoSb thin films are analyzed with XRD(X-ray diffraction) and AFM (atomic force microscopy).The electrical properties of the films are studied by Hall effect measurements.The results show that the TiCoSb thin films are uniform and dense,and have good adhension to the quartz glass substrate. The TiCoSb thin film annealed at 600℃for 5 min has better crystalline quality than those annealed at lower temperatures,having conductivity of 13.7 S/cm at room temperature.