Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors. Mechanistic Studies of the Thermolysis of Pt[CH2CMe2CH2CH═CH2]2 in Solution and the Origin of Rapid Nucleation

The compound cis-bis(η1,η2-2,2-dimethylpent-4-en-1-yl)platinum, Pt[CH2CMe2CH2CH═CH2]2 (3), is a recently discovered chemical vapor deposition (CVD) precursor for the deposition of highly smooth pla...