Relationship of the shape and size between etch pits and corresponding Te inclusions in CdZnTe crystals

Abstract The etch pits (EPs) corresponding to Te inclusions with shapes of triangle, hexagon and irregular polygon were investigated by etch pit real-time observation (EPRTO) method, and the relationship of size between EPs and inclusions was established. Although the evolution process of the EPs corresponding to triangular, hexagonal and irregular Te inclusions is obviously different during etching, the final characteristic is flat bottom triangular EP. There is a relationship between the ratio of the size of EPs to inclusions (S EP /S I ) and the initial size of Te inclusions (S I ).