Electroforming method suitable to fine structure with high depth-width ratio

This invention discloses a method for electroforming a microstructure with high depth/width ratio. The mask for electroforming is independent moveable mask with specific hollow patterns, which is independent on cathode and anode. During the electroforming process, the moveable mask can move toward the cathode according to the height of electroformed microstructure, thus can divide the microstructure with high depth/width ratio into several sections for electroforming. Therefore, the mass transfer condition for electroforming is largely improved, and the electroforming speed and quality are increased. The moveable mask can be used repeatedly, and is suitable for industrial production. The method can utilizes mask with limited height to process microstructure with theoretically unlimited depth/width ratio. The material of the microstructure can be single metal or alloy.