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{TiSi-nitride} attenuating phase-shift photomask for 193 nm lithography
{TiSi-nitride} attenuating phase-shift photomask for 193 nm lithography
1998
G. Hughes
Dj Jones
M Reilly
L. Wilson
Keywords:
Optoelectronics
Photomask
Lithography
Nitride
Materials science
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