A Zero Residual Layer Process for Microimprint Lithography Using a Soft Mold

We studied the formation of a resist pattern by a zero residual layer process with microimprint lithography (MIL) using a soft mold. Polyethylene glycol-dimethacrylate as an UV hardening-type resist and polydimethylsiloxane as a soft mold were used for the MIL process. The stripe and square patterns with a zero residual layer process were achieved on Cr/glass. UV ozone was treated on the Cr to achieve a hydrophilic surface for a zero residual layer process, which was confirmed by the measurements of cross-sectional scanning electron microscopy and energy-dispersive X-ray microanalysis.