Characterization of Rapid Thermally Nitrided Titanium Films Contacting Silicided and Non-Silicided Junctions
1992
In the present work we have studied rapid thermally nitrided titanium films which contact self-aligned silicided titanium disilicide (TiSi2-salicided) and non-silicided junctions. We correlate electrical contact resistance data to SIMS results.
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