Characterization of Rapid Thermally Nitrided Titanium Films Contacting Silicided and Non-Silicided Junctions

Sailesh Chittipeddi,M. J. Kelly,C. M. Dziuba,R. B. Irwin,P. M. Kahora,V. C. Kaiman,William Thomas Cochran

Characterization of Rapid Thermally Nitrided Titanium Films Contacting Silicided and Non-Silicided Junctions

1992

Sailesh Chittipeddi
M. J. Kelly
C. M. Dziuba
R. B. Irwin
P. M. Kahora
V. C. Kaiman
William Thomas Cochran

In the present work we have studied rapid thermally nitrided titanium films which contact self-aligned silicided titanium disilicide (TiSi2-salicided) and non-silicided junctions. We correlate electrical contact resistance data to SIMS results.

Keywords:

Nitriding
Metallurgy
Titanium
Materials science

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