An optical element having a plurality of facet elements refletiven

The present invention relates to an optical element for use in an illumination optics of a EUV microlithography projection exposure apparatus comprising a plurality of reflective facet elements (1) each having at least a reflective surface (5). At least one facet element rotatably (1) is arranged about a rotation axis (9), wherein the axis of rotation (9) the at least one reflective surface (5) intersects this facet element (1). With the help of such an optical element in a simple manner the direction and / or the intensity of at least a portion of the illumination radiation can be varied within the illumination optics.