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High index optical materials for 193 nm immersion lithography
High index optical materials for 193 nm immersion lithography
2006
Simon G. Kaplan
John H. Burnett
Eric L. Shirley
Deane Horowitz
Wilfried Clauss
Andrew Grenville
C Van Peski
Keywords:
Materials science
high index
optical materials
Immersion lithography
Optoelectronics
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