Impact of illumination source symmetrization in OPC
2008
It is well known that optical proximity effects are highly dependent upon the details of the illumination
source. Tremendous effort is taken to match illumination source profiles between tools, as well as to
appropriately represent the source intensity distribution in the models used for OPC and post-OPC
verification. OPC software typically models the intensity profile in such a manner that empirical fitting of
the CD data during model calibration can result in a representation of the "effective" source. In some
cases, an actual measured source profile is available and can be referenced directly in the OPC recipe.
However, it is common to average the 4 quadrants of a measured source profile such that the source
representation is symmetrical about the x and y axes. This is done so that optical proximity correction can
be applied hierarchically, with a single correction applied to a cell which may be instantiated in multiple
orientations within the chip. It has generally been accepted that the positive runtime benefit accompanying
this symmetrization is beneficial relative to any potential accuracy loss for cells oriented in different
directions. In this paper, we investigate the impact of real source profile asymmetries on identical features
with different orientations.
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