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Advanced Nitrogen Preimplant Gate Oxide Technique for Suppression of RNWE and RSCE for 0.18 um CMOS Technology
Advanced Nitrogen Preimplant Gate Oxide Technique for Suppression of RNWE and RSCE for 0.18 um CMOS Technology
1999
Huang
Puchner
Kamath
Ho
Keywords:
Optoelectronics
Nitrogen
Gate oxide
CMOS
Materials science
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