Stoichiometry, structure and mechanical properties of co-sputtered Ti1-xTaxB2±Δ coatings

Abstract Magnetron co-sputtering from TiB 2 and TaB 2 stoichiometric targets is used to prepare AlB 2 -prototype ternary Ti 1-x Ta x B 2±Δ solid solution, with x in the range from 0 to 1. Using this technique, the boron-to-metal ratio (B/Me) varies with the actual Ti and Ta content. The boron-to‑tantalum ratio can be increased by decreasing the TaB 2 target voltage, which has a considerable effect on the coating structure. Coatings with B/Me > 2 reveal highly textured nanocolumnar structure, while the coatings with B/Me