Plasma diagnostics in ECRIN-a prototype microwave plasma reactor for thin film deposition

Summary form only given. Plasma parameters values and profiles determined from probe and multi-grid electron/ion energy analyser measurements show that the microwave plasma reactor called ECRIN (Electron Cyclotron Resonance ions Negatifs) can be considered as a small volume (1.7 l) prototype of a plasma deposition reactor for polymer photoresist stripping following microlithography. The set-up comprises the microwave (mw) applicator (2.45 GHz, TE10 waveguide, 240 V/cm electric field intensity peak value at 500 W incident mw power), permanent magnets at mw entrance (primary ECR zone) and the cylindrical plasma chamber (multimode mw cavity) with a picket-fence magnetic field (secondary ECR zone) and an exit through which vacuum (order of mtorr) and diagnostics are installed.