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Increasing silicon epitaxial growth rate for minimal CVD reactor
Increasing silicon epitaxial growth rate for minimal CVD reactor
2018
Toshinori Takahashi
Mitsuko Muroi
Miya Matsuo
Habuka Hitoshi
Shinichi Ikeda
Yuuki Ishida
Shiro Hara
Keywords:
Materials science
Optoelectronics
Epitaxy
Silicon
Correction
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