Comprehensive study of structural and optical properties of LT-GaAs epitaxial structures

The results of the comprehensive study of LT-GaAs epitaxial structures on GaAs and Si substrates by high-energy electron diffraction, reflection anisotropy spectroscopy, atomic force microscopy, X-ray diffraction, Raman scattering, and photoluminescence methods are presented. The results obtained indicate the existence of several channels of nonequilibrium carrier recombination, which depend, in particular, on the substrate type and on the complex dependence of the concentration of structural imperfections on the used technology and growth conditions of the structures.