De Haas-van Alphen effect in CeTl3 under pressure

Abstract We report the pressure dependence of electrical resistivity and de Haas-van Alphen effect in an antiferromagnet CeTl 3 . With increasing pressure the Neel temperature T N decreases monotonically and both ρ 0 and A values of the resistivity ρ = ρ 0 + AT 2 in the Fermi liquid relation increase, reflecting the approach to the quantum critical point. The critical pressure P c is estimated to be about 6 GPa. The cyclotron effective masses also increase with increasing pressure.