Numerical simulation of plasma confinement in DC magnetron sputtering under different magnetic fields and anode structures

The plasma confinement between the electrodes in direct current magnetron sputtering has been investigated by using the two-dimensional hybrid model. We have quantitatively clarified plasma behavior for different magnetic fields and anode structures. The results show that plasma can be confined in the space near the sputtering target by applying a center-dominant magnetic array even in the absence of an anode facing the target (cathode). This knowledge is expected to be useful for film deposition on insulating materials such as glasses.