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Fabrication of Dual Nanopatterns at desired area using Block Copolymer Containing Photocleavable Linker
Fabrication of Dual Nanopatterns at desired area using Block Copolymer Containing Photocleavable Linker
2019
Chungryong Choi
Soyeong Park
Yeseong Seo
Jaeyong Lee
Seonghyeon Ahn
Eunseol Kim
Jin Kim
Keywords:
Copolymer
Fabrication
Nanotechnology
Linker
Materials science
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