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US2011/0006406A1: Fabrication of Porogen Residue Free and Mechanically Robust Low-k Materials
US2011/0006406A1: Fabrication of Porogen Residue Free and Mechanically Robust Low-k Materials
2011
Adam Urbanowicz
Patrick Verdonck
Denis Shamiryan
Kris Vanstreels
Mikhail Baklanov
Stefan De Gendt
Keywords:
Residue (complex analysis)
UV curing
Plasma-enhanced chemical vapor deposition
Young's modulus
Composite material
Materials science
Fabrication
Correction
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