Method and apparatus for temperature control of the surface temperatures of substrates in a CVD reactor

The invention relates to a method for temperature control of the surface temperature of on dynamic gas cushions (3) carried by the rotary actuators (2) of a rotationally driven susceptor (1), each gas cushion (3) is formed by an individually controlled gas flow and each gas flow depending on one of a temperature measuring member (4) the measured surface temperature of an individual actuator (5) is variable. For an advantageous improvement is proposed that the actuators (5) supporting a susceptor (1), the susceptor (1) rotationally driving the carrier (6) are associated with the surface temperatures of several substantially annular about the center axis (Z) of the susceptor (1 ) arranged rotary plate (2) (of a temperature measuring member 4) are measured successively, and the gas streams are varied to the associated gas cushions (3) corresponding in succession.