Si基板上に形成した多結晶Bi4-xLaxTi3O12薄膜の容量‐電圧(C‐V)ヒステリシス特性と界面状態の評価

2006 
Keywords:
    • Correction
    • Source
    • Cite
    • Save
    • Machine Reading By IdeaReader
    0
    References
    0
    Citations
    NaN
    KQI
    []