Reflective mask blank, a method of manufacturing a reflective mask blank manufacturing method of a reflective mask and a semiconductor device

In the defect inspection using the highly sensitive defect inspection apparatus, the pseudo defect detection and suppression, foreign matter and reflective mask that can facilitate the discovery of the critical defect such as scratches caused by the surface roughness of the substrate and film to provide a blank. On the main surface of the substrate for a mask blank, a reflective mask blank having a multilayer film for a mask blank comprising a multilayer reflective film and the absorber film by laminating a high refractive index layer and a low refractive index layer alternately, in the region of 3 [mu] m × 3 [mu] m in the reflective mask blank surface multilayer film for the mask blank is formed, the root mean square obtained by measuring an atomic force microscope roughness (Rms) is located at 0.5nm or less and a reflective mask blank, wherein the power spectral density of the spatial frequency 1 to 10 [mu] m