Method for storing treatment liquid for semiconductor devices and treatment liquid-containing body

The objective of the present invention is to provide: a method for storing a treatment liquid for semiconductor devices containing at least one substance selected from among hydroxylamine and hydroxylamine salts, which is not susceptible to deterioration of the residue removal performance of the treatment liquid even if temperature environment change between cold storage and standing at room temperature is repeated; and a treatment-liquid containing body. A method for storing a treatment liquid for semiconductor devices according to the present invention stores a treatment liquid for semiconductor devices, which contains at least water and at least one substance selected from among hydroxylamine and hydroxylamine salts, in a storage container. According to this method for storing a treatment liquid for semiconductor devices, the void ratio within the storage container is set to 0.01-30% by volume. In this connection the void ratio is obtained by the following formula (1). Formula (1): Void ratio = {1 - (volume of treatment liquid for semiconductor devices within storage container)/(container volume of storage container)} × 100