Positive type photo-sensitive siloxane composition

A kind of positive type photo-sensitive siloxane composition, it contains: solution rate of the film of (I) after at least two or more different polysiloxanes of the solution rate in tetramethylammonium hydroxide (TMAH) aqueous solution, (II) prebake conditions in 2.38% weight TMAH aqueous solution is 50~1,000 Polysiloxanes, (III) diazo-naphthalene-based quinone derivative and (IV) solvent with the TMAH aqueous solution soluble groups other than silanol group of/second.