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The Fabrication of CMOS Structures with Increased Immunity to Latchup Using the Two‐Step Epitaxial Process
The Fabrication of CMOS Structures with Increased Immunity to Latchup Using the Two‐Step Epitaxial Process
1985
L. Jastrzebski
J.F. Corboy
R. Soydan
R. Pagliaro
C. Magee
Keywords:
Analytical chemistry
Chemical vapor deposition
Leakage (electronics)
Epitaxy
CMOS
Insulator (electricity)
Integrated circuit
Chemistry
two step
Optoelectronics
Fabrication
Electrical engineering
Correction
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